2025年9月9日 · SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development - Agreement builds on more than a decade of collaboration …

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Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

PlateRite 8600NII-Z/S/E De facto standard 8 page thermal CtP delivering the best balance of productivity and exposure quality These systems feature the latest fiber laser diode exposure …

*APAC: Advanced Process Atmosphere Control. Screen’s ultra-clean chamber technology.

2025年9月24日 · Through this joint development agreement, IBM and SCREEN will work to further accelerate the development of cleaning technologies for advanced semiconductor …

The combination of a high-power laser and GLV™ technology delivers sharp and clear halftone dots, which is the core technology of the PlateRite Ultima 40000N to meet the stringent …

To address this issue, as a leader in semiconductor production equipment, the SCREEN Group has developed an innovative technology for reducing organic wastewater with the potential to …

With SCREEN’s over 30-year technical know-how, the system supports advanced immersion ArF lithography, E-Beam and Directed Self-Assembly (DSA) coat / develop / bake track solutions …

The SS-80EX features the same advanced spin scrubber technology developed by SCREEN over many years while also delivering significantly improved functionality. High-speed processing of …