Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

In analog layout design, precise layout matching techniques are crucial to ensure the accuracy and performance of the circuit so that transistors exhibit similar electrical properties (i.e.

Calibre Pattern Matching allows you to define specific geometric configurations as visual patterns, directly from a design layout. With this visual representation, Calibre Pattern Matching opens up a ...