Multipatterning challenges are forcing design teams to work much more closely with manufacturing—and to absorb some of the costs. The days when chip designers could throw tape “over the wall” to the ...

Imec and ASML have made a breakthrough in litho by printing 24nm pitch lines, corresponding to the dimensions of critical BEOL metal layers of a 3nm node process. By combining advanced imaging schemes ...

To address the urgent issue of how to manage process variability in the early stages of design creation, Mentor Graphics Corp. today announced its production-proven Calibre Litho-Friendly Design (LPD) ...

Imec and ASML have made a breakthrough in litho by printing 24nm pitch lines, corresponding to the dimensions of critical BEOL metal layers of a 3nm node process. By combining advanced imaging schemes ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

The ability to print pre-assembled optical and electronic structures with high resolution would greatly reduce the cost of a number of technologies. A printing method that uses a nanoparticle ink ...

No matter which side of the aisle you find yourself standing on from a political standpoint, the 10% tariff that the Trump administration has imposed on imported aluminum is now being passed through ...