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23 小时
消息称内存原厂考虑 HBM4 采用无助焊剂键合,进一步降低层间间隙
在这一背景下,三大内存原厂均注意到了现有 HBM 键合工艺使用的助焊剂:助焊剂可清理 DRAM Die 表面的氧化层,保证键合过程中机械和电气连接不会受到氧化层影响;但助焊剂的残余也会扩大各 Die 之间的间隙,提升整体堆栈高度。
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