ASML showcases its advanced holistic lithography solutions at SEMICON India 2025, driving innovation and shaping the future ...

High Numerical Aperture Extreme Ultraviolet, or High NA EUV, lithography tools are among some of the newest and most ...

When SK Hynix claims to shrink computer chips beyond physics' limits, semiconductor rivals scramble to decode whether it's ...

SK hynix Inc. announced it has assembled what the company said is the industry’s first high numerical aperture extreme - Read ...

Abstract: This paper presents an electron beam spot intensity distribution characterization method using suspended-nanomembrane-based spot measurement wafers, standard test patterns and a model for ...

A research team has developed a direct optical lithography (DOL) technology that patterns quantum dots (QDs) at ultra-high ...

An international team of researchers led by Johns Hopkins University engineers unveiled a novel microchip fabrication method that pushes chip design to new heights. Their enhanced tiny microchip ...

Semiconductor lithography leader ASML attended SEMICON India 2025 for the first time, emphasising its commitment to ...

SK Hynix Inc. has assembled the first high numerical aperture extreme ultraviolet (High NA EUV) lithography for mass production at its M16 fab in Icheon, South Korea.

Karen Weise, a tech reporter who has covered data centers, writes: ...